Category :Abatement systems,
Abatement of semiconductor process exhaust stream using a high-temperature burner. - Choice of high energy and medium energy burners allows for efficient abatement of the wide range of processes. - Energy Saving Mode feature conserves utility - Self-cleaning reactor design extends PM interval - System core & module swap maintenance capability reduces PM duration - GWG (CF4, SF6, NF3, etc.) - Corrosive gas (Cl2, F2, BCl3, HBr, etc.) - Flammable gas (SiH4, TEOS, DCS, H2, etc.)
- Choice of high energy and medium energy burners allows for efficient abatement of the wide range of processes. - Energy Saving Mode feature conserves utility - Self-cleaning reactor design extends PM interval - System core & module swap maintenance capability reduces PM duration - GWG (CF4, SF6, NF3, etc.) - Corrosive gas (Cl2, F2, BCl3, HBr, etc.) - Flammable gas (SiH4, TEOS, DCS, H2, etc.)
